Google Scholar|
2020
|
45. Dae Seon Kwon, Cheol Hyun An, Sang Hyeon Kim, Dong Gun Kim, Junil Lim, Woojin Jeon*, Cheol Seong Hwang*, “Atomic layer deposition of Ru thin films using (2, 4-dimethyloxopentadienyl)(ethylcyclopentadienyl) Ru and the effect of ammonia treatment during the deposition” Journal of Materials Chemistry C 8, 6993 (Jun. 2020) [link]
44. Youngjin Kim§, Woojin Jeon§, Minsung Kim, Jong Hyuk Park, Cheol Seong Hwang*, and Sang-SooLee*, “Modulated filamentary conduction of Ag/TiO2 core-shell nanowires to impart extremely sustained resistance switching behavior in a flexible composite” Applied Materials Today 19, 100569 (Jun. 2020) §These authors are equally contributed to this work. [link]
43. Wan-Ho Choi, MinJung Kim, Woojin Jeon*, and Jin-Seong Park*, “Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors” AIP Advances 10, 015239 (Jan. 2020) [link]
|
|
2019
|
41. Soon Hyung Cha, Cheol Hyun An, Seong Tak Cho, Dong-Gun Kim, Dae Seon Kwon, Jun Il Lim, Woojin Jeon*, and Cheol Seong Hwang*, “Scaling the equivalent oxide thickness by employing a TiO2 thin film on a ZrO2-Al2O3-based dielectric for the further scaling of the dynamic random access memory” Physica Status Solidi RRL 13(10), 1900282 (Oct. 2019) [link]
40. Cheol Hyun An, Woojin Jeon, Sang Hyeon Kim, Cheol Jin Cho, Dae Seon Kwon, Dong Gun Kim, Woongkyu Lee*, Cheol Seong Hwang*, “Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas” Journal of Physical Chemistry C 123(36), 22539 (Aug. 2019) [link]
39. MinJung Kim, Hyun-Jun Jeong, Jiazhen Sheng, Wan-Ho Choi, Woojin Jeon*, and Jin-Seong Park*, “The impact of plasma-enhanced atomic layer Deposited ZrSiOx insulators on low voltage operated in-Sn-Zn-O thin film transistors” Ceramics International 45(15), 19166 (Oct. 2019) [link]
38. Ju-Hwan Han, Su Ho Lim, Jin-Myung Choi, Seong-Hyeon Lee, Woojin Jeon*, and Jin-Seong Park*, “Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition” Ceramics International 45(6), 7407 (Apr. 2019) [link]
37. Wan-Ho Choi, Jiazhen Sheng, Hyun-Jun Jeong, Jin-Seong Park*, MinJung Kim, and Woojin Jeon*, “Improved performance and stability of In-Sn-Zn-O thin film transistor by introducing a meso-crystalline ZrO2 high-k gate insulator”Journal of Vacuum Science & Technology A37(2), 020924 (Mar. 2019) [link]
36. Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim, Cheol Jin Cho, Dong-Gun Kim, Dae SeonKwon, Seong Tak Cho, Soon Hyung Cha, Jun Il Lim, Woojin Jeon,* and Cheol Seong Hwang*,"Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition" Physica Status Solidi RRL 13(3), 1800454, (Mar 2019) [link]
35. Woojin Jeon,* Olivier Salicio, Ahmad Chaker, Patrice Gonon, and Christophe Vallée, "Controlling the Current Conduction Asymmetry of HfO₂ Metal-Insulator-Metal Diodes by Interposing Al₂O₃ Layer" IEEE Transactions on Electron Devices 66(1), 402-406 (Jan. 2019) [link]
| ||||
|
2018
|
34. Woongkyu Lee, Cheol Hyun An, Sijung Yoo, Woojin Jeon, Min Jung Chung, Sang Hyeon Kim, and Cheol Seong Hwang, "Electrical Properties of ZrO2/Al2O3/ZrO2-Based Capacitors with TiN, Ru, and TiN/Ru Top Electrode Materials" Physica Status Solidi RRL 1800356, (Aug 2018) [link]
33. Ju-Hwan Han, Jin-Myung Choi, Seong-Hyeon Lee, Woojin Jeon,* and Jin-Seong Park,* "Chemistry of SiNx thin film deposited by plasma-enhanced atomic layer deposition using di-isopropylaminosilane (DIPAS) and N2 plasma" Ceramics International 44(17), 20890-20895 (Dec. 2018) [link]
| ||||||||
|
2017
|
29. Woojin Jeon, Yeonchoo Cho, Sanghyun Jo, Ji-Hoon Ahn, and Seong-Jun Jeong, “Wafer-Scale Synthesis of Reliable High-Mobility Molybdenum Disulfide Thin Films via Inhibitor-Utilizing Atomic Layer Deposition”, Advanced Materials 29(47), 1703031 (Dec. 2017) [link] / Highlighted in Front Cover [link]
28. Woojin Jeon and Ji-Hoon Ahn, “Depletion Effect of Polycrystalline-Silicon Gate Electrode by Phosphorus Deactivation”, Solid-State Electronics 127, 1-4 (Jan. 2017) [link]
|
|
2016
|
27. Seong-Jun Jeong, Hyo Won Kim, Jinseong Heo, Min-Hyun Lee, Hyun Jae Song, JiYeon Ku, Yunseong Lee, Yeonchoo Cho, Woojin Jeon, Hwansoo Suh, Sungwoo Hwang and Seongjun Park, “Physisorbed-precursor-assisted atomic layer deposition of reliable ultrathin dielectric films on inert graphene surfaces for low-power electronics”, 2D Materials 3(3), 035027 (Sep. 2016) [link]
26. Yunseong Lee†, Woojin Jeon†, Yeonchoo Cho, Min-Hyun Lee, Seong-Jun Jeong, Jongsun Park, Seongjun Park, “Mesostructured HfxAlyO2 thin films as reliable and robust gate dielectrics with tunable dielectric constants for high-performance graphene-based transistors”, ACS Nano 10(7), 6659-6666 (Jun. 2016) †These authors are equally contributed to this work. [link]
25. Jun Cheol Park, Kyoung Ryun Lee, Hoseok Heo, Se-Hun Kwon, Jung-Dae Kwon, Myoung-Jae Lee, Woojin Jeon, Seong-Jun Jeong, and Ji-Hoon Ahn, “Vapor Transport Synthesis of Two-Dimensional SnS2 Nanocrystals Using a SnS2 Precursor Obtained from the Sulfurization of SnO2”, Crystal Growth & Design 16, 3884-3889 (Jun. 2016) [link]
24. Yu Jin Kim, Min Hyuk Park, Young Hwan Lee, Han Joon Kim, Woojin Jeon, Taehwan Moon, Keum Do Kim, Doo Seok Jeong, Hiroyuki Yamada and Cheol Seong Hwang, "Frustration of Negative Capacitance in Al2O3/BaTiO3 Bilayer Structure", Scientific Reports 6, 19039 (Jan. 2016) [link]
|
|
2015
|
23. Yu Jin Kim, Min Hyuk Park, Woojin Jeon, Han Joon Kim, Taehwan Moon, Young Hwan Lee, Keum Do Kim, Seung Dam Hyun, and Cheol Seong Hwang, "Interfacial charge-induced polarization switching in Al2O3/Pb(Zr,Ti)O3 bi-layer", Journal of Applied Physics 118, 224105 (Dec. 2015) [link]
22. Woongkyu Lee, Sijung Yoo, Woojin Jeon, Yeon Woo Yoo, Cheol Hyun An, Min Jung Chung, Han Joon Kim, SangWoon Lee, and Cheol Seong Hwang, "Reducing the nano-scale defect formation of atomic-layer-deposited SrTiO3 films by adjusting the cooling rate of the crystallization annealing of the seed layer", Thin Solid Films 589, 723-729 (Aug. 2015) [link]
21. Woojin Jeon, Sang Ho Rha, Woongkyu Lee, Cheol Hyun An, Min Jung Chung, Sang Hyun Kim, Cheol Jin Cho, Seong Keun Kim, and Cheol Seong Hwang, "Asymmetry in electrical properties of Al-doped TiO2 film with respect to bias voltage", Physica Status Solidi RRL 9(7), 410 (Jul. 2015) [link]
20. Woongkyu Lee, Woojin Jeon, Cheol Hyun An, Min Jung Chung, Han Joon Kim, Taeyong Eom, Sheby Mary George, Bo Keun Park, Jeong Hwan Han, Chang Gyoun Kim, Taek-Mo Chung, Sang Woon Lee, and Cheol Seong Hwang, "Improved Initial Growth Behavior of SrO and SrTiO3 Films Grown by Atomic Layer Deposition Using {Sr(demamp)(tmhd)}2 as Sr-Precursor", Chemistry of Materials 27(11), 3881-3891 (Jun. 2015) [link]
19. Da-Young Yeom, Woojin Jeon, Nguyen Dien Kha Tu, So Young Yeo, Sang-Soo Lee, Bong June Sung, Hyejung Chang, Jung Ah Lim & Heesuk Kim, “High-concentration boron doping of graphene nanoplatelets by simple thermal annealing and their supercapacitive properties”, Scientific Reports 5, 9817 (May 2015) [link]
18. Jeeyoon Jeong, Jiyeah Rhie, Woojin Jeon, Cheol Seong Hwang, and Dai-Sik Kim, "High-throughput fabrication of infinitely long 10 nm slit arrays for terahertz applications", Journal of Infrared, Millimeter, and Terahertz Waves 36(3), 262 (Mar. 2015) [link]
|
|
2014
|
17. Yeon Woo Yoo, Woojin Jeon, Woongkyu Lee, Cheol Hyun An, Seong Keun Kim, and Cheol Seong Hwang, "Structure and Electrical Properties of Al-Doped HfO2 and ZrO2 Films Grown via Atomic Layer Deposition on Mo Electrodes", ACS Applied Materials & Interfaces 6(24), 22474 (Dec. 2014) [link]
16. Woojin Jeon, Woongkyu Lee, Yeon Woo Yoo, Cheol Hyun An, Jeong Hwan Han, Seong Keun Kim, and Cheol Seong Hwang, “Chemistry of Active Oxygen in RuOx and Its Influence on the Atomic Layer Deposition of TiO2 Films”, Journal of Materials Chemistry C 2, 9993 (Dec. 2014) [link]
15. Woojin Jeon, Sijung Yoo, Hyo Kyeom Kim, Woongkyu Lee, Cheol Hyun An, Min Jung Chung, Cheol Jin Cho, Seong Keun Kim, and Cheol Seong Hwang, “Evaluating the Top Electrode Material for Achieving an Equivalent Oxide Thickness Smaller than 0.4 nm from an Al-doped TiO2 Film”, ACS Applied Materials & Interfaces 6(23), 21632 (Dec. 2014) [link]
14. Han Joon Kim, Min Hyuk Park, Yu Jin Kim, Young Hwan Lee, Woojin Jeon, Taehong Gwon, Taehwan Moon, Keum Do Kim, and Cheol Seong Hwang, "Grain size engineering for ferroelectric Hf0.5Zr0.5O2 films by an insertion of Al2O3 interlayer", Applied Physics Letters 105, 192903 (Nov. 2014) [link]
13. Min Hyuk Park, Han Joon Kim, Yu Jin Kim, Woojin Jeon, Taehwan Moon, and Cheol Seong Hwang, "Ferroelectric properties and switching endurance of Hf0.5Zr0.5O2 films on TiN bottom and TiN or RuO2 top electrodes", Physica Status Solidi RRL 8(6) 532 (Jun. 2014) [link]
12. Woojin Jeon, Sang Ho Rha, Woongkyu Lee, Yeon Woo Yoo, Cheol Hyun An, Kwang Hwan Jung, Seong Keun Kim, and Cheol Seong Hwang, "Controlling the Al-Doping Profile and Accompanying Electrical Properties of Rutile-Phased TiO2 Thin Films", ACS Applied Materials & Interfaces 6(10), 7910 (May 2014) [link]
|
|
2013
|
11. Sang Ho Rha, Un Ki Kim, Jisim Jung, Eun Suk Hwang, Seung Jun Lee, Woojin Jeon, Yeon Woo Yoo, Jung-Hae Choi, and Cheol Seong Hwang, "Variation in the threshold voltage of amorphous-In2Ga2ZnO7 thin-film transistors by ultrathin Al2O3 passivation layer", Journal of Vacuum Science & Technology B 31(6), 061205 (Nov. 2013) [link]
10. Jung Ho Yoon, Jeong Hwan Han, Ji Sim Jung, Woojin Jeon, Gun Hwan Kim, Seul Ji Song, Jun Yeong Seok, Kyung Jean Yoon, Min Hwan Lee, and Cheol Seong Hwang, "Highly Improved Uniformity in the Resistive Switching Parameters of TiO2 Thin Films by Inserting Ru Nanodots", Advanced Materials 25(14), 1987 (Apr. 2013) [link]
9. Woongkyu Lee, Jeong Hwan Han, Woojin Jeon, Yeon Woo Yoo, Sang Woon Lee, Seong Keun Kim, Chang-Hee Ko, Clement Lansalot-Matras, and Cheol Seong Hwang, "Atomic Layer Deposition of SrTiO3 Films with Cyclopentadienyl-Based Precursors for Metal-Insulator-Metal Capacitors", Chemistry of Materials 25(6), 953 (Mar. 2013) [link]
8. Gun Hwan Kim, Jong Ho Lee, Youngbae Ahn, Woojin Jeon, Seul Ji Song, Jun Yeong Seok, Jung Ho Yoon, Kyung Jean Yoon, Tae Joo Park, and Cheol Seong Hwang, "32x32 Crossbar Array Resistive Memory Composed of a Stacked Schottky Diode and Unipolar Resistive Memory", Advanced Functional Materials 23(11), 1440-1449 (Mar. 2013) [link]
7. Seong Keun Kim, Kyung Min Kim, Doo Seok Jeong, Woojin Jeon, Kyung Jean Yoon, and Cheol Seong Hwang, "Titanium dioxide thin films for next-generation memory devices", Journal of Materials Research 28(3), 313 (Feb. 2013) [link]
|
|
2012
|
6. Jeong Hwan Han, Woongkyu Lee, Woojin Jeon, Sang Woon Lee, Cheol Seong Hwang, Changhee Ko, Julien Gatineau, "Growth of Conductive SrRuO3 Films by Combining Atomic Layer Deposited SrO and Chemical Vapor Deposited RuO2 Layers", Chemistry of Materials 24(24), 4686 (Dec. 2012) [link]
5. Kiwon Oh, Woojin Jeon, and Sang-Soo Lee, “One-Dimensional TiO2@Ag Nanoarchitectures with Interface-Mediated Implementation of Resistance-Switching Behavior in Polymer Nanocomposites”, ACS Applied Materials & Interfaces 4(11), 5727 (Nov. 2012) [link]
4. Gun Hwan Kim, Jong Ho Lee, Woojin Jeon, Seul Ji Song, Jun Yeong Seok, Jung Ho Yoon, Kyung Jean Yoon, Tae Joo Park, and Cheol Seong Hwang, "Optimization of Chemical Structure of Schottky-Type Selection Diode for Crossbar Resistive Memory", ACS Applied Materials & Interfaces 4(10), 5338 (Oct. 2012) [link]
3. Seong Keun Kim, Sora Han, Woojin Jeon, Jung Ho Yoon, Jeong Hwan Han, Woongkyu Lee, and Cheol Seong Hwang, "Impact of Bimetal Electrodes on Dielectric Properties of TiO2 and Al-Doped TiO2 Films", ACS Applied Materials & Interfaces 4(9), 4726 (Sep. 2012) [link]
2. Woongkyu Lee, Jeong Hwan Han, Sang Woon Lee, Sora Han, Woo Jin Jeon and Cheol Seong Hwang, "Controlling the initial growth behavior of SrTiO3 films by interposing Al2O3 layers between the film and the Ru substrate", Journal of Materials Chemistry 22, 15037 (Aug. 2012) [link]
|
|
2007
|
1. Woojin Jeon, Hoi-Sung Chung, Daekwon Joo and Sang-Won Kang, “TiO2/Al2O3/TiO2 Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition”, Electrochemical and Solid-State Letters 11(2), H19 (Nov. 2007) [link]
|
