Google Scholar|
2021
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59. Dong Hee Han, Seungwoo Lee, Ji Hyeon Hwang, Youngjin Kim, Marceline Bonvalot, Christophe Vallée, Patrice Gonon, and Woojin Jeon*, "An Empirical Investigation on the Effect of Oxygen Vacancy in ZrO₂ Thin Film on the Frequency-Dependent Capacitance Degradation in the Metal-Insulator-Metal Capacitor" IEEE Transactions on Electron Devices 68(11), 5753-5757 (Sep. 2021) [link]
58. Ji-hoon Baek, Wan-ho Choi, Hohoon Kim, Seonghak Cheon, Younghun Byun, Woojin Jeon,* Jin-Seong Park* "Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor" Ceramics International 47(20), 29030 (Oct. 2021) [link]
57. Min Sung Kim, Youngjin Kim, Han-Hyeong Choi, Woojin Jeon, Jong Hyuk Park, Joona Bang, Sang-Soo Lee, "Sustained complementary resistive switching capability deployed by structure-modulated electric field confinement of core-shell nanowires in a simple polymer composite" Applied Materials Today 23, 101038 (May 2021) [link]
56. Dae Seon Kwon, Woojin Jeon, Dong Gun Kim, Tae Kyun Kim, Haengha Seo, Junil Lim, Cheol Seong Hwang, "Improved Properties of the Atomic Layer Deposited Ru Electrode for Dynamic Random-Access Memory Capacitor Using Discrete Feeding Method" ACS Appl. Mater. Interfaces 13(20), 23915 (May 2021) [link]
55. Byung Jun Kim, Jun Hyung Jeong, Eui Young Jung, Tae Yeon Kim, Sungho Park, Jong-Am Hong, Kyu-Myung Lee, Woojin Jeon, Yongsup Park, Seong Jun Kang "A visible-light phototransistor based on the heterostructure of ZnO and TiO2 with trap-assisted photocurrent generation" RSC Advances 11(20), 12051 (Mar. 2021) [link]
54. Sungho Park, Byung Jun Kim, Tae Yeon Kim, Eui Young Jung, Kyu-Myung Lee, Jong-Am Hong, Woojin Jeon, Yongsup Park, Seong Jun Kang, "Improving the photodetection and stability of a visible-light QDs/ZnO phototransistor via an Al2O3 additional layer" Journal of Materials Chemistry C 9(7), 2550 (Feb. 2021) [link]
53. Dong Gun Kim, Cheol Hyun An, Sang Hyeon Kim, Dae Seon Kwon, Junil Lim, Woojin Jeon,* and Cheol Seong Hwang*, "Optimized Al-doped TiO 2 gate insulator for a metal-oxide-semiconductor capacitor on a Ge substrate" Journal of Materials Chemistry C 9(5), 1572 (Jan. 2021) / Highlighted in front cover. [link]
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2020
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51. Youngjin Kim, Minsung Kim, Jong Hyuk Park, Keun-Young Shin, Sang-Soo Lee*, Woojin Jeon*, "Highly sustainable mechanical/electrical resistance switching behaviors via one-dimensional Ag/TiO2 core-shell resistive switchable materials in flexible composite" Organic Electronics 88, 105968 (Nov. 2020) [link]
50. Youngjin Kim, Minsung Kim, Ji Hyeon Hwang, Tae Whan Kim, Sang-Soo Lee*, Woojin Jeon*, "Sustainable resistance switching performance from composite-type ReRAM device based on carbon Nanotube@ Titania core–shell wires" Scientific Reports 10, 18830 (Nov. 2020) [link]
48. Younjin Jang, Jun Shik Kim, Sukin Kang, Jihun Kim, Yonghee Lee, Kwangmin Kim, Whayoung Kim, Heenang Choi, Nayeon Kim, Taeyong Eom, Taek-Mo Chung, Woojin Jeon, Sang Yoon Lee, Cheol Seong Hwang*, "Comparative Study on the Gate‐Induced Electrical Instability of p‐Type SnO Thin‐Film Transistors with SiO2 and Al2O3/SiO2 Gate Dielectrics" Physica status solidi (RRL)–Rapid Research Letters 14, 2000304 (Oct. 2020) [link]
47. Byung Jun Kim, Sungho Park, Tae Yeon Kim, Eui Young Jung, Jong-Am Hong, Beom-Su Kim, Woojin Jeon, Seong Jun Kang*, "Improving the photoresponsivity and reducing the persistent photocurrent effect of visible-light ZnO/quantum-dot phototransistors via a TiO2 layer", Journal of Materials Chemistry C 8, 16384 (Sep. 2020) [link]
46. Wan-Ho Choi, Woojin Jeon*, Jin-Seong Park*, "Nanoscale surface engineering of a high-k ZrO2/SiO2 gate insulator for a high performance ITZO TFT via plasma-enhanced atomic layer deposition", Journal of Materials Chemistry C 8, 13342 (Aug. 2020) [link]
45. Dae Seon Kwon, Cheol Hyun An, Sang Hyeon Kim, Dong Gun Kim, Junil Lim, Woojin Jeon*, Cheol Seong Hwang*, “Atomic layer deposition of Ru thin films using (2, 4-dimethyloxopentadienyl)(ethylcyclopentadienyl) Ru and the effect of ammonia treatment during the deposition” Journal of Materials Chemistry C 8, 6993 (Jun. 2020) [link]
44. Youngjin Kim§, Woojin Jeon§, Minsung Kim, Jong Hyuk Park, Cheol Seong Hwang*, and Sang-SooLee*, “Modulated filamentary conduction of Ag/TiO2 core-shell nanowires to impart extremely sustained resistance switching behavior in a flexible composite” Applied Materials Today 19, 100569 (Jun. 2020) §These authors are equally contributed to this work. [link]
43. Wan-Ho Choi, MinJung Kim, Woojin Jeon*, and Jin-Seong Park*, “Investigating the interface characteristics of high-k ZrO2/SiO2 stacked gate insulator grown by plasma-enhanced atomic layer deposition for improving the performance of InSnZnO thin film transistors” AIP Advances 10, 015239 (Jan. 2020) [link]
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2019
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42. [REVIEW] Woojin Jeon*, “Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications” Journal of Materials Research 35(7), 775 (Apr. 2020) [link]
41. Soon Hyung Cha, Cheol Hyun An, Seong Tak Cho, Dong-Gun Kim, Dae Seon Kwon, Jun Il Lim, Woojin Jeon*, and Cheol Seong Hwang*, “Scaling the equivalent oxide thickness by employing a TiO2 thin film on a ZrO2-Al2O3-based dielectric for the further scaling of the dynamic random access memory” Physica Status Solidi RRL 13(10), 1900282 (Oct. 2019) [link]
40. Cheol Hyun An, Woojin Jeon, Sang Hyeon Kim, Cheol Jin Cho, Dae Seon Kwon, Dong Gun Kim, Woongkyu Lee*, Cheol Seong Hwang*, “Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas” Journal of Physical Chemistry C 123(36), 22539 (Aug. 2019) [link]
39. MinJung Kim, Hyun-Jun Jeong, Jiazhen Sheng, Wan-Ho Choi, Woojin Jeon*, and Jin-Seong Park*, “The impact of plasma-enhanced atomic layer Deposited ZrSiOx insulators on low voltage operated in-Sn-Zn-O thin film transistors” Ceramics International 45(15), 19166 (Oct. 2019) [link]
38. Ju-Hwan Han, Su Ho Lim, Jin-Myung Choi, Seong-Hyeon Lee, Woojin Jeon*, and Jin-Seong Park*, “Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition” Ceramics International 45(6), 7407 (Apr. 2019) [link]
37. Wan-Ho Choi, Jiazhen Sheng, Hyun-Jun Jeong, Jin-Seong Park*, MinJung Kim, and Woojin Jeon*, “Improved performance and stability of In-Sn-Zn-O thin film transistor by introducing a meso-crystalline ZrO2 high-k gate insulator”Journal of Vacuum Science & Technology A37(2), 020924 (Mar. 2019) [link]
36. Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim, Cheol Jin Cho, Dong-Gun Kim, Dae SeonKwon, Seong Tak Cho, Soon Hyung Cha, Jun Il Lim, Woojin Jeon,* and Cheol Seong Hwang*,"Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition" Physica Status Solidi RRL 13(3), 1800454, (Mar 2019) [link]
35. Woojin Jeon,* Olivier Salicio, Ahmad Chaker, Patrice Gonon, and Christophe Vallée, "Controlling the Current Conduction Asymmetry of HfO₂ Metal-Insulator-Metal Diodes by Interposing Al₂O₃ Layer" IEEE Transactions on Electron Devices 66(1), 402-406 (Jan. 2019) [link]
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