Welcome to L'ete @ Kyung Hee Univ.
경희대 정보전자신소재공학과 전자재료연구실(Lab. of Electronic-Materials Tech. & Eng., L'ete)에서는 DRAM, Flash memory 등 메모리 반도체에서부터 2D 재료 등 차세대 반도체 재료의 물성 및 증착 공정, 이를 활용한 새로운 소자 개발에 대한 연구를 수행하고 있습니다.

Research Interests
Semiconductor Materials
  • Evaluating physical and electrical properties of high-k (Al2O3, ZrO2, HfO2, TiO2...) and 2D materials (Graphene, MoS2...) 
  • Novel material and devices development by organic-inorganic hybridization
  • Device physics especially on dielectric and interface between dielectric and metal
Electronic Devices
  • Novel FETs fabrication with 2D (graphene, TMDCs, …) and high-k materials
  • Extremely low power-consumption technology of semiconductor for IoT
  • Flexible and transparent system for wearable device application
  • Next-generation memory applications (DRAM, Flash memory, resistance-switching memory...)​​
Thinfilm Deposition Techniques
  • Deposition process evaluation with atomic layer deposition (ALD), chemical vapor deposition (CVD), and physical vapor deposition (PVD) techniques for its device applications

Latest News & Announcement

1 Feb. 2023
New members, Mr. LEE, Junho, Ms. HWANG, Chaeyoung, and Mr. NAM, Jihun join to l'ete. Welcome!
2 Dec. 2022
Prof. JEON awarded a patent prize from SK Hynix.
13-16 Nov. 2022
L'ete gave two poster presentations on the KISM2022 conference.
Ms. KIM Ye Won's paper was selected as a "Best paper award" in KISM2022. Congrats!
27 Oct. 2022
Mr. HAN Dong Hee selected as the recipient of scholarship from AMK/Korea semiconductor industry association.
28 Sep. 2022
Ms. KIM Ye Won's paper was highlighted as front inside cover of Journal of Materials Chemistry C. 
​28 Sep. 2022
Ms. KIM Ye Won's paper entitled "Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications" has been published in Journal of Materials Chemistry C. 
​25-28 Sep. 2022
L'ete gave a poster presentation on the KJC-FE13 conference.
Mr. HAN Dong Hee's paper was selected as a "Excellent presentation award" in KJC-FE13. Congrats!
​21 Sep. 2022
Ms. CHOI Yoenju's paper entitled "Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process" has been published in Scientific Reports. 
Lab. of Electronic-Materials Tech. & Eng. (L'ete)
Dept. of Advanced Materials Engineering for Information & Electronics, Kyung Hee University (c) 2018