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2019
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42. [REVIEW] Woojin Jeon*, “Recent advances in the understanding of high-k dielectric materials deposited by atomic layer deposition for dynamic random-access memory capacitor applications” Journal of Materials Research 35(7), 775 (Apr. 2020) [link]
41. Soon Hyung Cha, Cheol Hyun An, Seong Tak Cho, Dong-Gun Kim, Dae Seon Kwon, Jun Il Lim, Woojin Jeon*, and Cheol Seong Hwang*, “Scaling the equivalent oxide thickness by employing a TiO2 thin film on a ZrO2-Al2O3-based dielectric for the further scaling of the dynamic random access memory” Physica Status Solidi RRL 13(10), 1900282 (Oct. 2019) [link]
40. Cheol Hyun An, Woojin Jeon, Sang Hyeon Kim, Cheol Jin Cho, Dae Seon Kwon, Dong Gun Kim, Woongkyu Lee*, Cheol Seong Hwang*, “Substrate Effects on the Growth Behavior of Atomic-Layer-Deposited Ru Thin Films Using RuO4 Precursor and N2/H2 Mixed Gas” Journal of Physical Chemistry C 123(36), 22539 (Aug. 2019) [link]
39. MinJung Kim, Hyun-Jun Jeong, Jiazhen Sheng, Wan-Ho Choi, Woojin Jeon*, and Jin-Seong Park*, “The impact of plasma-enhanced atomic layer Deposited ZrSiOx insulators on low voltage operated in-Sn-Zn-O thin film transistors” Ceramics International 45(15), 19166 (Oct. 2019) [link]
38. Ju-Hwan Han, Su Ho Lim, Jin-Myung Choi, Seong-Hyeon Lee, Woojin Jeon*, and Jin-Seong Park*, “Optimization of a SiOx/SiNxOyCz multilayer structure for a reliable gas diffusion barrier via low-temperature plasma-enhanced atomic layer deposition” Ceramics International 45(6), 7407 (Apr. 2019) [link]
37. Wan-Ho Choi, Jiazhen Sheng, Hyun-Jun Jeong, Jin-Seong Park*, MinJung Kim, and Woojin Jeon*, “Improved performance and stability of In-Sn-Zn-O thin film transistor by introducing a meso-crystalline ZrO2 high-k gate insulator”Journal of Vacuum Science & Technology A37(2), 020924 (Mar. 2019) [link]
36. Cheol Hyun An, Woongkyu Lee, Sang Hyeon Kim, Cheol Jin Cho, Dong-Gun Kim, Dae SeonKwon, Seong Tak Cho, Soon Hyung Cha, Jun Il Lim, Woojin Jeon,* and Cheol Seong Hwang*,"Controlling the Electrical Characteristics of ZrO2/Al2O3/ZrO2 Capacitors by Adopting a Ru Top Electrode Grown via Atomic Layer Deposition" Physica Status Solidi RRL 13(3), 1800454, (Mar 2019) [link]
35. Woojin Jeon,* Olivier Salicio, Ahmad Chaker, Patrice Gonon, and Christophe Vallée, "Controlling the Current Conduction Asymmetry of HfO₂ Metal-Insulator-Metal Diodes by Interposing Al₂O₃ Layer" IEEE Transactions on Electron Devices 66(1), 402-406 (Jan. 2019) [link]
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