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2023
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48. (poster) Yoona Choi, Aejin Lee, Hansol Oh, Yongjoo Park, and Woojin Jeon, "Improvement in dielectric properties of ZrO2 thin film by employing thermal stability enhanced Zr precursor in high-temperature atomic layer deposition", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
47. (poster) Seungwoo Lee, Dong Hee Han, Hyeon Ho Seol, Min Kyeong Nam, Daeyeong Kim, Hansol Oh, Hanbyul Kim, Yongjoo Park, and Woojin Jeon, "Suppression of interfacial layer formation in ZrO2-based capacitors with TiN electrode by adopting MgO thin films as an oxygen diffusion barrier", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
46. (poster) Hyeon ho Seol, Seung woo Lee, and Woojin Jeon, "Atomic layer deposited vanadium oxides with various crystallinity for uncooled IR sensor application", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
45. (poster) Jeong Hyeon Park, Ye won Kim, and Woojin Jeon, "Formation of Mo thin film from ALD-Mo2N using subsequent reduction process with introducing a mechanical strain applying layer", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
44. (poster) Jonghwan Jeong, Aejin Lee, and Woojin Jeon, "Enhancing the electrical characteristics of ZrO2-TiSiN based MIM capacitor by introducing Y2O3 inserting layer", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
43. (poster) Yewon Kim, Jeong Hyeon Park, Songyi Moon, Taewon Youn, Younjae Jung, Eul Han, Yongwoon Jang, Minyung Lee, and Woojin Jeon, "Self-isolation electrode formation by selective deposition behavior of MoO2/MoO3 thin films by atomic layer deposition", 23rd International Conference on Atomic Layer Deposition (ALD 2023), Bellevue WA USA (JULY 23-26, 2023)
42. (INVITED) Woojin Jeon, "Self-aligned electrode/insulator formation on the DRAM capacitor by the simultaneous MoO2/MoO3 deposition", Global conference on innovation materials 2023 (GCIM2023) (June 9, 2023)
41. (INVITED) 전우진, "Micro-structure modulation of thin film deposited by atomic layer deposition", 2023 한국세라믹학회 춘계학술대회, 제주 (2023년 4월 10일)
40. (poster) Soo Min Yoo, Dong Hee Han, Min Kyeong Nam, Seungwoo Lee, Yewon Kim, and Woojin Jeon, "Chemisorption inhibition control for molybdenum disulfide thin film by atomic layer deposition", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
39. (poster) Seungwoo Lee, Dong Hee Han, Hyeon Ho Seol, Min Kyeong Nam, Daeyeong Kim, Hansol Oh, Hanbyul Kim, Yongjoo Park, and Woojin Jeon, "Suppression of interfacial layer formation in ZrO2-based capacitors with TiN electrode by adopting MgO thin films as an oxygen diffusion barrier", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
38. (poster) YoungUk Ryu, Hansol Oh, Inchun Hwang, Yongjoo Park, and Woojin Jeon, "Improving electrical properties by employing the stacked structure of Y-doped HfO2 / ZrO2 for the dynamic random access memory application ", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
37. (poster) Yoona Choi, Aejin Lee, Hansol Oh, Yongjoo Park, and Woojin Jeon, "Improvement in dielectric properties of ZrO2 thin film by employing thermal stability enhanced Zr precursor in the atomic layer deposition", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
36. (poster) Su Jin Choi, Dong Hee Han, and Woojin Jeon, "Improved Endurance Characteristic in Ferroelectric Hf0.5Zr0.5O2 Capacitor by Inserting Y2O3 Layer", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
35. (poster) Jonghwan Jeong, Aejin Lee,and Woojin Jeon, "Improve ZrO2-TiSiN Electrical Characteristics by Introducing Y2O3", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
34. (poster) Jeong Hyeon Park, YeWon Kim, and Woojin Jeon, "Laminated Structure for the Reduction Process of Molybdenum Nitride to Molybdenum to Avoid Structural Degradation for the Metal-Insulator-Metal Capacitor Application", The 30th Korean Conference on Semiconductors, Gangwon Korea (15th Feb. 2023)
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