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2022
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30. (invited) Woojin Jeon, "Atomic layer deposition techniques “for” the 2D material and “on” the 2D material", The 20th International Symposium on the Physics of Semiconductors and Applications (ISPSA 2022), Ramada Plaza Jeju Hotel, Jeju, Korea (July 17-21, 2022)
29. (poster) Min Kyeong Nam, Aejin Lee, Dong Hee Han, Seungwoo Lee, and Woojin Jeon, "Development of High-k Gate Insulator Deposition Process for Next-Generation Thin Film Transistor Using Atomic Layer Deposition", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
28. (poster) Seungwoo Lee, Dong Hee Han, Min Kyeong Nam, Ye Won Kim, Donghyun Kim, Kyungmok Kim, Yongjoo Park, and Woojin Jeon, "Growth of Rutile TiO2 on VO2 by Atomic Layer Deposition for DRAM Capacitor Application", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
27. (poster) Yewon Kim, Ae Jin Lee, Dong Hee Han, Songyi Moon, Taewon Youn, Minyung Lee, and Woojin Jeon, "Atomic-layer-deposited Molybdenum Dioxide Thin Films as Promising Electrode Candidates for Application to Next-generation-dynamic-random-access-memory Devices", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
26. (poster) YoungUk Ryu, Hyeonho Seol, Hansol Oh, Inchun Hwang, Yongjoo Park, and Woojin Jeon, "Investigating the Y-Doped HfO2 Thin Film for the Metal-Insulator-Metal Capacitor Application Using a Cocktail Precursor", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
25. (poster) Dong Hee Han, Ae Jin Lee, Minkyeong Nam, Taehwan Moon, and Woojin Jeon, "Wake-Up-Free Metal-Ferroelectric-Metal Capacitor Consisted of Hf0.5Zr0.5O2 and Tin(200) Bottom Electrode", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
24. (poster) Aejin Lee, Minkyeong Nam, Yewon Kim, and Woojin Jeon, "Improving Properties of Atomic-layer deposited ZrO2 Thin Film by Employing the Discrete Feeding Method with Various Zr-based Precursors", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
23. (poster) Yoenju Choi, Taehoon Kim, Hangyul Lee, Jusung Park, Juhwan Park, Dongho Ryu, and Woojin Jeon, "차세대 Device Seamless Gap-fill 공정을 위해 Inhibitor를 이용한 SiO2 PE-ALD 공정 개발", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
22. (poster) Dong Hee Han, Ae Jin Lee, Minkyeong Nam, Taehwan Moon, and Woojin Jeon, "A Wake-up-free Effect in Metal-ferroelectric-metal Capacitor Consisted of Hf0.5Zr0.5O2 and TiN(200) Bottom Electrode", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
21. (poster) Aejin Lee, Yewon Kim, Seungwoo Lee, Minkyeong Nam, and Woojin Jeon, "Improving Growth Rate of Atomic-Layer Deposited ZrO2Thin Film Using Discrete Feeding Method of Zr-Based Precursor", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
20. (poster) Seungwoo Lee, Dong Hee Han, Min Kyeong Nam, Ye Won Kim, Dong Hyun Kim, Kyung Mog Kim, Yong Joo Park, and Woojin Jeon, "Growth of Rutile TiO2 Using VO2 Thin Films Deposited by Atomic Layer Deposition", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
19. (poster) Young Uk Ryu, Jenam Kim, Hansol Oh, Inchun Hwang, Yong Joo Park, and Woojin Jeon, "Enhancement of Y-doped HfO2 Thin Film Atomic Layer Deposition Process Using Liquid Delivery System", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
18. (poster) Min Kyeong Nam, Dong Hee Han, Seungwoo Lee, and Woojin Jeon, "Development of High-k Gate Insulator Deposition Process for Next-generation Thin Film Transistor Using Atomic Layer Deposition", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
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2021
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17. (poster) Min Kyeong Nam, Eui Young Jung, Ji Hyeon Hwang, Jaewon Ahn, Woojin Jeon "Selective and localized nanosecond UV laser annealing for amorphous TiO2 thin film: Transform to rutile high-k dielectric
and improve its electrical properties", IUMRS-ICA 2021, Korea (7th Oct. 2021) 16. (poster) Dae Cheol Lee, Byung Seok Kim, Ji Hyeon Hwang, Dong Hee Han, Ae Jin Lee and Woojin Jeon "Improvement of ZrO2-TiN interface properties using passivation layer to suppress interfacial layer formation" IUMRS-ICA 2021, Korea (7th Oct. 2021)
15. (poster) Ae Jin Lee, Ji Hyeon Hwang, Dong Hee Han, and Woojin Jeon "Inducing tetragonal-phase HfO2 by applying the laminated structure with ZrO2 for the DRAM capacitor application", IUMRS-ICA 2021, Korea (7th Oct. 2021)
14. (poster) Jenam Kim, Byung Seok Kim, Ae Jin Lee, Dong Hee Han, Ji Hyeon Hwang, Youngjin Kim, Ki-Chang Song, Hansol Oh, Sangho Kim, Yong Joo Park, and Woojin Jeon "Y-doped HfO2 deposited by ALD using a Cocktail Precursor for DRAM Capacitor Dielectric Application", IUMRS-ICA 2021, Korea (7th Oct. 2021)
13. (poster) Dong Hee Han, Seungwoo Lee, Ji Hyeon Hwang, and Woojin Jeon "An empirical investigation on the effect of oxygen vacancy in ZrO2 thin film on the frequency-dependent capacitance degradation in the metal-insulator-metal capacitor", IUMRS-ICA 2021, Korea (7th Oct. 2021)
12. (poster) Ye Won Kim, Ji Hyeon Hwang, Dae Cheol Lee, Woojin Jeon "MoO2 thin film as a conductive oxide electrode for the next generation DRAM capacitor using atomic layer deposition", IUMRS-ICA 2021, Korea (7th Oct. 2021)
11. (poster) Ae Jin Lee, Byung Seok Kim, Ji Hyeon Hwang, Dong Hee Han, and Woojin Jeon "Optimizing the laminated structure of high-k dielectric consisting of ZrO2 and HfO2 for Dynamic Random Access Memory capacitor", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021)
10. (poster) Ye Won Kim, Byung Seok Kim, Dae Cheol Lee, and Woojin Jeon "Atomic layer deposition of MoO2 as thermally stable conductive oxide for the metal electrode for the next generation DRAM capacitor", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021)
9. (poster) Dong Hee Han, Ji Hyeon Hwang, and Woojin Jeon "Investigation of the frequency dependent dielectric characteristics of ZrO2 based high-k dielectrics", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021)
8. (poster) Ji Hyeon Hwang, Minsung Kim, Youngjin Kim, Eui Young Jung, Sang-Soo Lee, and Woojin Jeon
"Complementary Resistive Switching Characteristics based on Silver Nanoparticles Embedded Zirconium Oxide Using Atomic Layer Deposition", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021) 7. (poster) Jenam Kim, Byung Seok Kim, Ae Jin Lee, and Woojin Jeon "Enhancing the electrical properties of ALD-grown homogeneous ZrxHf1-xO2 thin film by CpZr-CpHf cocktail precursor using liquid deliverysystem", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021)
6. (poster) Byung Seok Kim, Ji Hyeon Hwang, Dong Hee Han, and Woojin Jeon "Improved interface properties of ZrO2-TiN using passivation layer to suppress interfacial layer caused degradation", The 28th Korean Conference on Semiconductors, (virtual) Korea (28th Jan. 2021)
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2020
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2019
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