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Deposition process evaluation with atomic layer deposition (ALD), chemical vapor deposition (CVD), and physical vapor deposition (PVD) techniques for its device applications
Representative Papers
Advanced Materials 29(47) 1703031 (2017) ACS Nano 10(7) 6659 (2016) 2D Materials 3(3) 035027 (2016) Scientific Reports 5 9817 (2015) Journal of Materials Chemistry C 2 9993 (2014) |
[ALD of 2D materials]
[ALD of high-k dielectrics on 2D materials]
[Synthesizing Boron-doped p-type Graphene]
[Evaluating the Mechanism of Accelerated Initial Growth of TiO2 Films on RuOx Substrate]
[ALD of perovskite oxide]
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