L'ETE@KYUNG HEE UNIV.
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Alumni

그림
KIM, Ye Won / 김예원
Master of Science (Feb. 2023) 
​Thesis title: Atomic layer deposition of MoO2​ as thermally stable conductive oxide​ for the metal electrode​ for the next generation DRAM capacitor
Current affiliation: LG Energy Solution

그림
NAM, Min Kyeong / 남민경
Master of Science (Aug. 2023)
Theis title: A comparative study of Zr precursor for application to high-k gate insulator of the next-generation thin film transistor using atomic layer deposition​
Current affiliation: LG Display
그림
HAN, Dong Hee / 한동희
Master of Science (Feb. 2023)
Theis title: The effect of oxygen vacancy and Al dopant on the electrical properties of ZrO2 based metal-insulator-metal capacitor​
Current affiliation: Seoul National University (as Ph.D. student)
그림
LEE, Ae Jin/ 이애진
Master of Science (Feb. 2023)
Theis title: Improving the electrical properties of metal-insulator-metal capacitor consisted of atomic-layer deposited HfO2 and ZrO2 thin films
Current affiliation: LG Display
그림
CHOI, Yoenju / 최연주
Master of Science (Aug. 2022)
Theis title: Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing the growth inhibition using the NH3 plasma pre-treatment for enhanced gap-fill characteristic
Current affiliation: Wonik IPS (원익IPS)
그림
HWANG, Ji Hyeon / 황지현
Master of Science​ (Feb. 2022)
Thesis title: Complementary Resistive Switching Behavior Controlled by Nanostructure Modulation
Current affiliation: LAM Research
그림
KIM, Jenam / 김제남
Master of Science​ (Feb. 2022)
Thesis title: HfO2-based high-k thin films deposited by atomic layer deposition using cocktail precursor for DRAM capacitor dielectric application
Current affiliation: LG Display​

그림
KIM, Byung Seok / 김병석
Master of Science (Feb. 2021)
Thesis title: Modulation of the adsorption chemistry of precursor in atomic layer deposition to enhance the growth per cycle of TiO2 thin film​
Current affiliation: Samsung Electronics
그림
JUNG, Eui Young / 정의영
Master of Science (Feb. 2021)
Thesis title: Chemistry Modulation of Ruthenium as an Electrode for the Metal-Insulator-Metal Capacitor Application
Current affiliation: Kyushu University (as Ph.D. student)
그림
AHN, Jay Jaewon / 안재원
Master of Science​ (Feb. 2021)
Thesis title: Selective and localized nanosecond UV laser annealing for amorphous TiO2 thin film: Transform to anatase high-k dielectric and improve its electrical properties
Current affiliation: MKS Instruments, Inc.


Lab. of Electronic-Materials Tech. & Eng. (L'ete)
Dept. of Advanced Materials Engineering for Information & Electronics, Kyung Hee University (c) 2018

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  • Home
  • Research
    • Semiconductor Materials
    • Electronic Devices
    • Thinfilm Deposition Techniques
  • Publication
    • Peer-reviewed Journal
    • Patent
    • Conference
  • Member
    • PI
    • Student
    • Alumni
    • Open Positions
  • Lecture
  • News
  • Contact