LEE, In Kyu / 이인규
Master of Science (Aug. 2024)
Thesis title: Hybrid reactant-enabled atomic layer deposition of HfO2 for enhancing metal-insulator-metal capacitor fabricated on TiN electrode
Current affiliation: Wonik IPS
Master of Science (Aug. 2024)
Thesis title: Hybrid reactant-enabled atomic layer deposition of HfO2 for enhancing metal-insulator-metal capacitor fabricated on TiN electrode
Current affiliation: Wonik IPS
PARK, Woo Young / 박우영
Master of Science (Aug. 2024)
Thesis title: Inducing the Tetragonal-phase HfO2 in ZrO2/HfO2 Stack by Introducing the Controlled Interfacial layer
Current affiliation: Wonik IPS
Master of Science (Aug. 2024)
Thesis title: Inducing the Tetragonal-phase HfO2 in ZrO2/HfO2 Stack by Introducing the Controlled Interfacial layer
Current affiliation: Wonik IPS
RYU, Young Uk / 류영욱
Master of Science (Aug. 2024)
Thesis title: Enhancement of electrical properties of HfO2, ZrO2-based MIM capacitors through doping and layering
Current affiliation: Samsung Electronics
Master of Science (Aug. 2024)
Thesis title: Enhancement of electrical properties of HfO2, ZrO2-based MIM capacitors through doping and layering
Current affiliation: Samsung Electronics
KIM, Ye Won / 김예원
Master of Science (Feb. 2023)
Thesis title: Atomic layer deposition of MoO2 as thermally stable conductive oxide for the metal electrode for the next generation DRAM capacitor
Current affiliation: LG Energy Solution
Master of Science (Feb. 2023)
Thesis title: Atomic layer deposition of MoO2 as thermally stable conductive oxide for the metal electrode for the next generation DRAM capacitor
Current affiliation: LG Energy Solution
NAM, Min Kyeong / 남민경
Master of Science (Aug. 2023)
Theis title: A comparative study of Zr precursor for application to high-k gate insulator of the next-generation thin film transistor using atomic layer deposition
Current affiliation: LG Display
Master of Science (Aug. 2023)
Theis title: A comparative study of Zr precursor for application to high-k gate insulator of the next-generation thin film transistor using atomic layer deposition
Current affiliation: LG Display
HAN, Dong Hee / 한동희
Master of Science (Feb. 2023)
Theis title: The effect of oxygen vacancy and Al dopant on the electrical properties of ZrO2 based metal-insulator-metal capacitor
Current affiliation: Seoul National University (as Ph.D. student)
Master of Science (Feb. 2023)
Theis title: The effect of oxygen vacancy and Al dopant on the electrical properties of ZrO2 based metal-insulator-metal capacitor
Current affiliation: Seoul National University (as Ph.D. student)
LEE, Ae Jin/ 이애진
Master of Science (Feb. 2023)
Theis title: Improving the electrical properties of metal-insulator-metal capacitor consisted of atomic-layer deposited HfO2 and ZrO2 thin films
Current affiliation: Samsung Electronics
Master of Science (Feb. 2023)
Theis title: Improving the electrical properties of metal-insulator-metal capacitor consisted of atomic-layer deposited HfO2 and ZrO2 thin films
Current affiliation: Samsung Electronics
CHOI, Yoenju / 최연주
Master of Science (Aug. 2022)
Theis title: Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing the growth inhibition using the NH3 plasma pre-treatment for enhanced gap-fill characteristic
Current affiliation: Wonik IPS (원익IPS)
Master of Science (Aug. 2022)
Theis title: Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing the growth inhibition using the NH3 plasma pre-treatment for enhanced gap-fill characteristic
Current affiliation: Wonik IPS (원익IPS)
HWANG, Ji Hyeon / 황지현
Master of Science (Feb. 2022)
Thesis title: Complementary Resistive Switching Behavior Controlled by Nanostructure Modulation
Current affiliation: LAM Research
Master of Science (Feb. 2022)
Thesis title: Complementary Resistive Switching Behavior Controlled by Nanostructure Modulation
Current affiliation: LAM Research
KIM, Jenam / 김제남
Master of Science (Feb. 2022)
Thesis title: HfO2-based high-k thin films deposited by atomic layer deposition using cocktail precursor for DRAM capacitor dielectric application
Current affiliation: LG Display
Master of Science (Feb. 2022)
Thesis title: HfO2-based high-k thin films deposited by atomic layer deposition using cocktail precursor for DRAM capacitor dielectric application
Current affiliation: LG Display
KIM, Byung Seok / 김병석
Master of Science (Feb. 2021)
Thesis title: Modulation of the adsorption chemistry of precursor in atomic layer deposition to enhance the growth per cycle of TiO2 thin film
Current affiliation: Samsung Electronics
Master of Science (Feb. 2021)
Thesis title: Modulation of the adsorption chemistry of precursor in atomic layer deposition to enhance the growth per cycle of TiO2 thin film
Current affiliation: Samsung Electronics
JUNG, Eui Young / 정의영
Master of Science (Feb. 2021)
Thesis title: Chemistry Modulation of Ruthenium as an Electrode for the Metal-Insulator-Metal Capacitor Application
Current affiliation: Kyushu University (as Ph.D. student)
Master of Science (Feb. 2021)
Thesis title: Chemistry Modulation of Ruthenium as an Electrode for the Metal-Insulator-Metal Capacitor Application
Current affiliation: Kyushu University (as Ph.D. student)
AHN, Jay Jaewon / 안재원
Master of Science (Feb. 2021)
Thesis title: Selective and localized nanosecond UV laser annealing for amorphous TiO2 thin film: Transform to anatase high-k dielectric and improve its electrical properties
Current affiliation: MKS Instruments, Inc.
Master of Science (Feb. 2021)
Thesis title: Selective and localized nanosecond UV laser annealing for amorphous TiO2 thin film: Transform to anatase high-k dielectric and improve its electrical properties
Current affiliation: MKS Instruments, Inc.
