Publication

Peer-reviewed Journal

Patent

Conference
2022
65.Yoenju Choi, Taehoon Kim, Hangyul Lee, Jusung Park, Juhwan Park, Dongho Ryu, and Woojin Jeon*, "Bottom-up plasma-enhanced atomic layer deposition of SiO2 by utilizing growth inhibition using NH3 plasma pre-treatment for seamless gap-fill process" Scientific Reports 12 15756 (Sep. 2022) [link]
s41598-022-20201-y.pdf
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64. Ye Won Kim, Ae Jin Lee, Dong Hee Han, Dae Cheol Lee, Ji Hyeon Hwang, Youngjin Kim, Songyi Moon, Taewon Youn, Minyung Lee, and Woojin Jeon*, "Reliable high work-function molybdenum dioxide synthesis via template-effect-utilizing atomic layer deposition for next-generation electrode applications" Journal of Materials Chemistry C 10 12957 (Sep. 2022) [link] / Highlighted in inside front cover article. [link]
d2tc02104h.pdf
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63. Ae Jin Lee, Byung Seok Kim, Ji Hyeon Hwang, Youngjin Kim, Hansol Oh, Yong Joo Park, and Woojin Jeon*, "Controlling the crystallinity of HfO2 thin film using the surface energy-driven phase stabilization and template effect" Applied Surface Science 590 153082 (July 2022) [link]
1-s2.0-s0169433222006481-main.pdf
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1-s2.0-s0169433222017330-main.pdf
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62. Jenam Kim, Young Uk Ryu, Ae Jin Lee, Ye Won Kim, Ji Hyeon Hwang, Youngjin Kim, Hansol Oh, Yong Joo Park, and Woojin Jeon*, "Achieving High Dielectric Constants in Tetragonal Single-Phase ZrHfO2 Thin Films through the Atomic Layer Deposition Process Using a Mixed Precursor" Physica Status Solid a 219(11) 2100652 (June 2022) [link]
physica_status_solidi__a_-_2022_-_kim_-_achieving_high_dielectric_constants_in_tetragonal_single_e2_80_90phase_zrhfo2_thin_films.pdf
File Size: 2805 kb
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Lab. of Electronic-Materials Tech. & Eng. (L'ete)
Dept. of Advanced Materials Engineering for Information & Electronics, Kyung Hee University (c) 2018