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2022
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33. (poster) Jeong Hyeon Park, Yewon Kim and Woojin Jeon, "Molybdenum thin film formation from molybdenum nitride deposited by plasma-enhanced atomic layer deposition with modulated plasma conditions", KISM2022, Paradise Hotel, Busan, Korea (Nov. 12, 2022)
32. (poster) Yewon Kim, Jeong Hyeon Park, Ae Jin Lee, Songyi Moon, Taewon Youn, Minyung Lee, and Woojin Jeon, "Selectively growing of MoOx thin films for the next-generation DRAM capacitor applications", KISM2022, Paradise Hotel, Busan, Korea (Nov. 12, 2022)
31. (poster) Dong Hee Han, Su Jin Choi, and Woojin Jeon, "Reduced imprint phenomena in Mo/Hf0.5Zr0.5O2/Mo metal-ferroelectric-metal capacitor by the modification of surface chemistry", KJC-FE13, Westin Josun Hotel, Busan, Korea (Sep. 27, 2022)
30. (invited) Woojin Jeon, "Atomic layer deposition techniques “for” the 2D material and “on” the 2D material", The 20th International Symposium on the Physics of Semiconductors and Applications (ISPSA 2022), Ramada Plaza Jeju Hotel, Jeju, Korea (July 17-21, 2022)
29. (poster) Min Kyeong Nam, Aejin Lee, Dong Hee Han, Seungwoo Lee, and Woojin Jeon, "Development of High-k Gate Insulator Deposition Process for Next-Generation Thin Film Transistor Using Atomic Layer Deposition", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
28. (poster) Seungwoo Lee, Dong Hee Han, Min Kyeong Nam, Ye Won Kim, Donghyun Kim, Kyungmok Kim, Yongjoo Park, and Woojin Jeon, "Growth of Rutile TiO2 on VO2 by Atomic Layer Deposition for DRAM Capacitor Application", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
27. (poster) Yewon Kim, Ae Jin Lee, Dong Hee Han, Songyi Moon, Taewon Youn, Minyung Lee, and Woojin Jeon, "Atomic-layer-deposited Molybdenum Dioxide Thin Films as Promising Electrode Candidates for Application to Next-generation-dynamic-random-access-memory Devices", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
26. (poster) YoungUk Ryu, Hyeonho Seol, Hansol Oh, Inchun Hwang, Yongjoo Park, and Woojin Jeon, "Investigating the Y-Doped HfO2 Thin Film for the Metal-Insulator-Metal Capacitor Application Using a Cocktail Precursor", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
25. (poster) Dong Hee Han, Ae Jin Lee, Minkyeong Nam, Taehwan Moon, and Woojin Jeon, "Wake-Up-Free Metal-Ferroelectric-Metal Capacitor Consisted of Hf0.5Zr0.5O2 and Tin(200) Bottom Electrode", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
24. (poster) Aejin Lee, Minkyeong Nam, Yewon Kim, and Woojin Jeon, "Improving Properties of Atomic-layer deposited ZrO2 Thin Film by Employing the Discrete Feeding Method with Various Zr-based Precursors", ALD/ALE 2022, The International Convention Center (ICC), Ghent, Belgium (June 28, 2022)
23. (poster) Yoenju Choi, Taehoon Kim, Hangyul Lee, Jusung Park, Juhwan Park, Dongho Ryu, and Woojin Jeon, "차세대 Device Seamless Gap-fill 공정을 위해 Inhibitor를 이용한 SiO2 PE-ALD 공정 개발", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
22. (poster) Dong Hee Han, Ae Jin Lee, Minkyeong Nam, Taehwan Moon, and Woojin Jeon, "A Wake-up-free Effect in Metal-ferroelectric-metal Capacitor Consisted of Hf0.5Zr0.5O2 and TiN(200) Bottom Electrode", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
21. (poster) Aejin Lee, Yewon Kim, Seungwoo Lee, Minkyeong Nam, and Woojin Jeon, "Improving Growth Rate of Atomic-Layer Deposited ZrO2Thin Film Using Discrete Feeding Method of Zr-Based Precursor", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
20. (poster) Seungwoo Lee, Dong Hee Han, Min Kyeong Nam, Ye Won Kim, Dong Hyun Kim, Kyung Mog Kim, Yong Joo Park, and Woojin Jeon, "Growth of Rutile TiO2 Using VO2 Thin Films Deposited by Atomic Layer Deposition", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
19. (poster) Young Uk Ryu, Jenam Kim, Hansol Oh, Inchun Hwang, Yong Joo Park, and Woojin Jeon, "Enhancement of Y-doped HfO2 Thin Film Atomic Layer Deposition Process Using Liquid Delivery System", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
18. (poster) Min Kyeong Nam, Dong Hee Han, Seungwoo Lee, and Woojin Jeon, "Development of High-k Gate Insulator Deposition Process for Next-generation Thin Film Transistor Using Atomic Layer Deposition", The 29th Korean Conference on Semiconductors, Gangwon Korea (25th Jan. 2022)
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